Continuous APCVD for 12 inch wafers
AMAX1200
- 51 WPH @ 12 inch wafers
- Metal addition Free design and Long Term Stable Process with SiC Tray
Feature
- 12 inch wafer Continuous APCVD system, based on long term AMAX Series.
- Developped wider area deposition dispersion head and minimize the number of trays to reduce the cost of system.
- SiC Trays as susceptors prevent heavy metal addition and help long term stable process for long term production.
- Good maintenability and Operators safety are given by automated head base liftting system and automated tray exchange system, that shorten PM time for longer use of system
Performance
| Film Thickness Nu |
≦±3.0％ |
| Wafer Size |
12 inch |
| Gas |
SiH4, O2, PH3, B2H6, N2 |
| Deposition Temp. |
～450℃ |
| Productivity |
51WPH |
Specifictions
| System Size |
2165㎜(W) x 4788㎜(D) x 2250㎜(H) |
| Heaters |
Heater Coils |
| Loader/Unloader |
Robot Cassette to Cassette Transfer |
| Dispersion Head (Gas Nozzle) |
A63 Type 3 Dispersion Head |
